Use of Re-etched and Re-polished
Epi-wafers for MBE Calibration Substrates
J. Lowmaster, R. Pelzel, M. Dydyk, D. Green
IQE, Inc.,
jlowmaster@iqep.com (610) 861-6930
Keywords: GaAs manufacturing, GaAs ICs, Epi-wafers,
MBE, Reclaim, Repolish etched substrates are suitable for “internal” reactor
calibration runs such as, doping calibrations, growth rate calibrations, and
bringing a reactor back on-line after a maintenance cycle.
Abstract:
Re-polished and re-etched 100mm SI GaAs Epi-wafers have been studied to
determine their usefulness as MBE reactor calibration substrates in place of
prime wafers.